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Tantalum Material Product Expansion

The tantalum material product portfolio is expanding from basic categories to high-end applications. In the semiconductor materials field, the 5N9 (99.9995%) ultra-high-purity tantalum target blank developed by the company achieves grain size control below 5μm and sputtering uniformity error of less than 2% through a multi-pass forging and isothermal annealing process, successfully applying it to the 7nm chip manufacturing process. The mass production of this target blank has reduced my country's dependence on imports of high-end tantalum targets from 85% to 40%.

Tantalum material innovations are also significant in the medical field. The company has developed a porous tantalum powder that, through gas atomization technology, achieves precise control of sphericity of 98% and porosity of 65%-75%. Clinically, 3D-printed intervertebral fusion devices have demonstrated bone ingrowth twice as fast as titanium alloy implants.

Tantalum-niobium alloys for aerospace use have overcome the problem of low-temperature brittleness. The Ta-10W alloy has an impact toughness of 80J/cm² at -269°C, meeting the extreme environmental requirements of deep space exploration equipment. The product has been used in the isotope heat source casing of the lunar exploration project.